The new 40nm-rated filter provides 40nm retention while maintaining the flow of next-best-in-class 50nm filters.

W. L. Gore & Associates (Gore) (Elkton, MD) has announced an addition to their line of high-performance cartridge filters for semiconductor applications. The new 40nm-rated filter, intended for use with chemicals in wet processes and distribution systems, provides 40nm retention while maintaining the flow of next-best-in-class 50nm filters. Additional features include:

• High-flow ePTFE filtration media.
• Upgraded retention.
• Reduced particle counts.
• Increased flow rates and bath turnovers.

For more information visit www.gore.com